[PDF] Self Assembly Of Block Copolymers For Nanopatterning eBook

Author : Nathanael Lap-Yan Wu
Publisher :
Page : 185 pages
File Size : 35,25 MB
Release : 2014
Category : Block copolymers
ISBN :

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The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the dimensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new fabrication strategies must be introduced for these remarkable advances to continue. One technology listed by the International Technology Roadmap for Semiconductors as a candidate for next-generation nanostructure fabrication is the directed self-assembly of block copolymers. Block copolymers have received significant attention of late for their ability to template large regular arrays of nanostructures with dimensions ranging from 10 to 50 nm. The production of denser sub-10 nm nanostructures is also possible by reducing the size of these polymers, but a reduction of the polymer size also compromises the quality of nanostructures, making small polymers extremely difficult to use. In this thesis, two different patterning approaches are introduced to push the nanostructure density limits possible for a given polymer. In the first, a novel patterning approach involving thin films of bilayer block copolymer domains is used to effectively double the nanostructure density patterned by a given polymer. The technique is successfully applied to different types and sizes of polymer, and can also form highly controlled arrays of patterns with the help of surface topography. By varying different process parameters during the self-assembly or subsequent plasma steps, the dimensions of these density-doubled patterns may be finely-tuned to the desired width and pitch. The surface coverage of these density-doubled nanostructures is also maximized through adjusting the film thickness and parameters in the self-assembly process. Besides using bilayer films, dense arrays of nanostructures may also be patterned using a multi-step patterning approach. In this approach, multiple layers of block copolymer films are subsequently deposited onto the substrate to template nanostructures. Because nanostructures from previous layers contribute to the surface topography, they influence the self-assembly of successive layers and more dense and complex patterns may be produced as a result.

Author : Dae Up Ahn
Publisher :
Page : 213 pages
File Size : 18,54 MB
Release : 2007
Category : Block copolymers
ISBN :

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"We have prepared well-aligned 3-dimensional block copolymer nano-cylinders over the entire sample area and thickness without any additional external field applications such as mechanical and electric fields. Self-assembled 3-dimensional perpendicular cylinder orientation was achieved by thermodynamic controls of incompatibility between the block components, and further elaborate modification of size and hexagonal alignment of perpendicular cylinders was also accomplished by kinetic controls of diffusive molecular mobility of block copolymer microdomains. Since those two controls have been mainly achieved by simple blending of minority homopolymer, the intrinsic advantages of block copolymer nanopatterning, such as fast and spontaneous 3-dimensional nanopatterning with a high thermodynamic stability and reproducibility, have been completely preserved in this fabrication strategy. After preparing block copolymer masks containing perpendicularly and hexagonally well-aligned nano-cylinders, a top-down method using excimer laser was applied to the block copolymer masks for a fast nanopattern transfer to organic and inorganic substrates in the form of nano-dots. Mask-image-like high-density polystyrene and silicon nano-dots were readily obtained after the one-step excimer laser irradiation on the block copolymer masks without any additional selective staining and/or etching steps before a non-selective etching process. The numerical analysis on the photothermal excimer laser ablation of periodically nanostructured block copolymer masks revealed that sufficiently low laser intensity was suitable for the one-step fabrication of mask image-like topographic nanopatterns on the surface of silicon substrates, as long as the intensity was high enough to induce a matrix-assisted photothermal excimer laser ablation in less UV-sensitive block component. Therefore, we illustrate a novel nanofabrication technique using a top-down after bottom-up method to create new opportunities for the fabrication of low-cost and high-throughput nanostructured materials with highly ordered 3-dimensional nanopatterns."--Abstract.

Author : Xuanxuan Chen
Publisher :
Page : 141 pages
File Size : 38,79 MB
Release : 2017
Category :
ISBN : 9780355234336

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Block copolymers (BCPs) are a group of fascinating materials that self-assemble into highly uniform nanoscale structures. With precise control of interfacial properties on both interfaces, these nanostructures can be directed to form user-defined periodic patterns. The directed self-assembly (DSA) of BCPs offers a cost-effective solution to complement the conventional lithography with the capability of density multiplication and pattern rectification. This dissertation mainly focuses on the chemoepitaxial DSA of symmetric BCP into line patterns.

Author : P. Alexandridis
Publisher : Elsevier
Page : 449 pages
File Size : 30,64 MB
Release : 2000-10-18
Category : Science
ISBN : 0080527108

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It is the belief of the editors of this book that the recognition of block copolymers as being amphiphilic molecules and sharing common features with other well-studied amphiphiles will prove beneficial to both the surfactant and the polymer communities. An aim of this book is to bridge the two communities and cross-fertilise the different fields. To this end, leading researchers in the field of amphiphilic block copolymer self-assembly, some having a background in surfactant chemistry, and others with polymer physics roots, have agreed to join forces and contribute to this book.The book consists of four entities. The first part discusses theoretical considerations behind the block copolymer self-assembly in solution and in the melt. The second part provides case studies of self-assembly in different classes of block copolymers (e.g., polyethers, polyelectrolytes) and in different environments (e.g., in water, in non-aqueous solvents, or in the absence of solvents). The third part presents experimental tools, ranging from static (e.g., small angle neutron scattering) to dynamic (e.g., rheology), which can prove valuable in the characterization of block copolymer self-assemblies. The fourth part offers a sampling of current applications of block copolymers in, e.g., formulations, pharmaceutics, and separations, applications which are based on the unique self-assembly properties of block copolymers.

Author : Yingdong Luo
Publisher :
Page : 183 pages
File Size : 33,79 MB
Release : 2015
Category :
ISBN : 9781339218977

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Block copolymer self-assembly has been used as nanopatterning towards applications of lithography for decades. For the purpose of smaller, faster and cheaper transistor developments, block copolymers with high Flory-Huggins parameter and better etching contrast need to be further developed. PDMS based block copolymers are of the most interest among all candidates. I synthesized a library of well defined PDMS-b-PMMA, PDMS-b-PS and PDMS-b-PEO through "click" chemistry. The Flory-Huggins interaction parameters of these block copolymers are characterized much higher than conventional block copolymers as expected. Therefore, sub-10 nm domain periods are achieved by these materials in bulk. Significantly, long range ordered nanoline and nanodot patterns have been produced by PDMS-b-PMMA. Furthermore, a small molecule (L)-tartaric acid used as a hydrogen bonding donor was proved to efficiently suppress the crystallinity of PEO and significantly enhance the self-assembly behavior. Finally, the triazole moiety in the middle of the block copolymer which synthesized by "click" chemistry was functionalized to produce an ionic junction block copolymer. The electrostatic interactions before the opposite charges act as an extra enthalpy to help the self-assembly. Therefore, order disorder transition temperature of the block copolymer was dramatically increased.

Author : Roel Gronheid
Publisher : Woodhead Publishing
Page : 328 pages
File Size : 12,88 MB
Release : 2015-07-17
Category : Technology & Engineering
ISBN : 0081002610

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The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

Author : Katsuhiko Ariga
Publisher : Elsevier
Page : 648 pages
File Size : 35,44 MB
Release : 2023-12-15
Category : Technology & Engineering
ISBN : 0323994733

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Materials Nanoarchitectonics: From Integrated Molecular Systems to Advanced Devices provides the latest information on the design and molecular manipulation of self-organized hierarchically structured systems using tailor-made nanoscale materials as structural and functional units. The book is organized into three main sections that focus on molecular design of building blocks and hybrid materials, formation of nanostructures, and applications and devices. Bringing together emerging materials, synthetic aspects, nanostructure strategies, and applications, the book aims to support further progress, by offering different perspectives and a strong interdisciplinary approach to this rapidly growing area of innovation. This is an extremely valuable resource for researchers, advanced students, and scientists in industry, with an interest in nanoarchitectonics, nanostructures, and nanomaterials, or across the areas of nanotechnology, chemistry, surface science, polymer science, electrical engineering, physics, chemical engineering, and materials science. Offers a nanoarchitectonic perspective on emerging fields, such as metal-organic frameworks, porous polymer materials, or biomimetic nanostructures Discusses different approaches to utilizing "soft chemistry" as a source for hierarchically organized materials Offers an interdisciplinary approach to the design and construction of integrated chemical nano systems Discusses novel approaches towards the creation of complex multiscale architectures

Author : Massimo Lazzari
Publisher : Wiley-VCH
Page : 447 pages
File Size : 27,85 MB
Release : 2007-06-27
Category : Technology & Engineering
ISBN : 3527610561

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This first book to take a detailed look at one of the key focal points where nanotechnology and polymers meet provides both an introductory view for beginners as well as in-depth knowledge for specialists in the various research areas involved. It investigates all types of application for block copolymers: as tools for fabricating other nanomaterials, as structural components in hybrid materials and nanocomposites, and as functional materials. The multidisciplinary approach covers all stages from chemical synthesis and characterization, presenting applications from physics and chemistry to biology and medicine, such as micro- and nanolithography, membranes, optical labeling, drug delivery, as well as sensory and analytical uses.