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Directed Self-assembly of Block Co-polymers for Nano-manufacturing

Author : Roel Gronheid
Publisher : Woodhead Publishing
Page : 328 pages
File Size : 35,88 MB
Release : 2015-07-17
Category : Technology & Engineering
ISBN : 0081002610

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The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

Polymer Thin Films

Author : Ophelia Kwan Chui Tsui
Publisher : World Scientific
Page : 312 pages
File Size : 28,95 MB
Release : 2008
Category : Science
ISBN : 9812818820

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Ch. 1. Block copolymer thin films / J.-Y. Wang, S. Park and T. P. Russell -- ch. 2. Equilibration of block copolymer films on chemically patterned surfaces / G. S. W. Craig, H. Kang and P. F. Nealey -- ch. 3. Structure formation and evolution in confined cylinder-forming block copolymers / G. J. A. Sevink and J. G. E. M. Fraaije -- ch. 4. Block copolymer lithography for magnetic device fabrication / J. Y. Cheng and C. A. Ross -- ch. 5. Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura ... [et al.] -- ch. 6. Wrinkling polymers for surface structure control and functionality / E. P. Chan and A. J. Crosby -- ch. 7. Crystallization in polymer thin films: morphology and growth / R. M. Van Horn and S. Z. D. Cheng -- ch. 8. Friction at soft polymer surface / M. K. Chaudhury, K. Vorvolakos and D. Malotky -- ch. 9. Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K. R. Shull -- ch. 10. Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- ch. 11. Anomalous dynamics of polymer Films / O. K. C. Tsui.

Directed Assembly of Block Copolymer Films Via Surface Energy Tunable Elastomers

Author : Arzu Hayirlioglu
Publisher :
Page : 138 pages
File Size : 20,1 MB
Release : 2014
Category : Block copolymers
ISBN :

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Ordering of block copolymer (BCP) thin films has been great interest for potential applications due to nanometer scale size self-assembly pattern formation. Numerous methods (chemical, physical, etc.) have been developed to create desired alignment and ordering properties in such block copolymer systems. However, the drawback of most current technologies such as brittleness and lack conformability to different surfaces makes them difficult to implement new emerging high-tech flexible technologies. On the other hand, there is a lack of knowledge in block copolymer wettability characteristics and morphological behavior on soft substrates which makes them attractive to explore for further investigations. A notable challenge in this regard is that successful deployment of BCPs for applications requires an understanding of BCP ordering properties on flexible substrate as a function of their surface chemistry, topography including patterning, roughness, stiffness, modulus and thermal conductivity, etc. Therefore, the general purpose of this research is to investigate the thermodynamics and kinetics of directed assembly of cylinder and lamellar forming polystyrene-block-polymethlymethacrylate (PS-b-PMMA) diblock copolymer films on elastomeric polydimethylsiloxane (PDMS) substrates with controlled surface energy and substrate topography. In first part, wettability characteristics of cylinder and lamellae forming PS-b-PMMA thin films versus surface energy of elastomeric PDMS substrates were increasing surface energy of PDMS by tuning with Ultraviolet Ozone (UVO) exposure and elasticity by varying the crosslinking concentration. In this extended wetting regime gradual perpendicular to parallel orientation change was shown for lamellar BCP films unlike cylindrical films where the transition was very sharp, reflecting lamellar BCP intrinsic stability over a wider range of substrate surface energy, consistent with theoretical estimates. In second part of the study, we extended the part on wettability characteristics of polystyrene (PS) homopolymer and PS-b-PMMA block copolymer thin films on flat, periodic and non-periodic nanopatterned elastomeric PDMS substrates. We discovered creating non-periodically nanopatterned surface properties induced retardation of BCP dewetting and mostly eliminate on periodically nanopatterned surface properties without any surface chemistry modification. Time kinetic study results also showed the patterning has a slowing down effect on dewetting mechanism for both homopolymer and block copolymer systems and dewetted droplet shape. In final part of this study, we focused on block copolymer morphology on periodically and non-periodically (rough) patterned elastomeric PDMS substrates with and without tuning the substrate surface energy via UVO exposure. The regular uniform film properties were achieved with parallel or perpendicular microdomain orientation to the substrate at even imcommensurate thicknesses which normally shows island and holes on flat surfaces. In addition to the bottom pattern confinement effect on BCP ordering, uniform size patterned elastomeric top capping layer was also used. Mixed or long range ordered structures were obtained with different annealing conditions.

Block Copolymers II

Author : Volker Abetz
Publisher : Springer Science & Business Media
Page : 272 pages
File Size : 45,78 MB
Release : 2005-12-02
Category : Technology & Engineering
ISBN : 9783540269021

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. A.J. M ller, V. Balsamo, M.L. Arnal: Nucleation and Crystallization in Diblock and Triblock Copolymers.- 2 J.-F. Gohy: Block Copolymer Micelles.- 3 M.A. Hillmyer: Nanoporous Materials from Block Copolymer Precursors.- 4 M. Li, C. Coenjarts, C.K. Ober: Patternable Block Copolymers.-