[PDF] Self Assembled Patterns Of Block Copolymer Homopolymer Blends eBook

Author : Dongsik Park
Publisher :
Page : 225 pages
File Size : 13,83 MB
Release : 2008
Category : Block copolymers
ISBN :

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Many researchers have studied the orientation behavior of block copolymers (BCPs) with the most recent works directed towards nanotechnologies. Self-assembly of block copolymers is very relevant in controlling periodic nanostructures for nanotechnological applications. Nanotechnological applications of BCPs are possible due to their physical properties related to mass and energy transport, as well as mechanical, electrical, and optical properties. These properties provide substantial benefits in nanostructure membranes, nanotemplates, photonic crystals, and high-density information storage media. In many applications, such nanopatterns need to be achieved as ordered and tunable structures. Consequently, the control of orientation of such structures with defect-free ordering on larger length scales still remain as major research challenge in many cases. In addition to their pure block forms, blends of copolymers with other polymers offer productive research areas in relation to nanostructural self-assembly. We prepared well-aligned nanocylinders into block copolymer over the enhanced sample area and scale of height without any external field applications or modification of interaction between the sample and the substrate. Self-assembled 3-dimensional perpendicular cylinder orientation was achieved mainly by blending of minority homopolymer into the blockcopolymer. Thus, this study investigated a spontaneous and simple method for the orientation of perpendicular cylinders in BCP/homopolymer mixtures on a preferential substrate, by increasing the interaction force between the homologous polymer pair at a fixed composition of minority block component. Since the thermodynamical changes have been simply accomplished by the control of incompatibility between the block components, the intrinsic advantages of block copolymer nanopatterning, such as fast and spontaneous 3-dimensional nanopatterning with a high thermodynamic stability and reproducibility, have been completely preserved in this fabrication strategy. By exploiting thermodynamical changes using temperature variation and by blending a homopolymer with well controlled molecular weight, we illustrated that redistribution of homopolymer resulted in a shift of phase boundaries and in the stabilization of well-ordered structures to create new opportunities for nanotechnologies.

Author : Li-Chen Cheng (Ph.D.)
Publisher :
Page : 188 pages
File Size : 11,52 MB
Release : 2019
Category :
ISBN :

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Self-assembly of block copolymers (BCPs) is emerging as a promising route for numerous technological applications to fabricate a variety of nanoscopic structures. The resulting feature sizes range from a few to several hundred nanometers, and are readily tunable by varying the molecular weights of block copolymers. Directed self-assembly of block copolymer is an effective way to pattern periodic arrays of features with long-range order, to generate complex patterns, and to multiplicatively increase the pattern density and resolution that are far beyond the limit of conventional lithography. Despite of the significant progress in the area of directed self-assembly in recent years, critical research problems regarding the dimension scalability toward sub-10-nm regime and large feature sizes on hundreds of nanometers scale as well as the capability of generating complex device-oriented patterns remain challenging. In this thesis, BCP systems, including high-v BCPs that are capable of self-assembling into extreme small and large feature sizes as well as those with more complex block architectures, are identified and studied in order to understand how those materials may be processed and directed selfassembly to bridge the patterning size spectrum between nano- and micro-fabrication. Another focus is placed on the scientific exploration of directed self-assembly of triblock terpolymers and the investigation on the mechanisms that regulate the scaling and geometry of self-assembled patterns. A comprehensive understanding about self-assembly of BCP thin films will enable developing device-oriented geometries, manipulating BCPs phase behavior, and incorporating new functional materials for a wider range of applications. In the meanwhile, optimizing the processing condition of self-assembly of various BCPs is essential to confirm viability of the directed self-assembly of block copolymers process in manufacturing.

Author : Roel Gronheid
Publisher : Woodhead Publishing
Page : 328 pages
File Size : 33,88 MB
Release : 2015-07-17
Category : Technology & Engineering
ISBN : 0081002610

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The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

Author : Li-Tang Yan
Publisher : John Wiley & Sons
Page : 384 pages
File Size : 23,44 MB
Release : 2016-10-06
Category : Science
ISBN : 1119113156

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Provides comprehensive knowledge on concepts, theoretical methods and state-of-the-art computational techniques for the simulation of self-assembling systems Looks at the field of self-assembly from a theoretical perspective Highlights the importance of theoretical studies and tailored computer simulations to support the design of new self-assembling materials with useful properties Divided into three parts covering the basic principles of self-assembly, methodology, and emerging topics

Author :
Publisher :
Page : pages
File Size : 15,59 MB
Release : 2016
Category :
ISBN :

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Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. We expand on traditional DSA chemical patterning. Moreover, a blend of lamellar- and cylinder-forming block copolymers assembles on specially designed surface chemical line gratings, leading to the simultaneous formation of coexisting ordered morphologies in separate areas of the substrate. The competing energetics of polymer chain distortions and chemical mismatch with the substrate grating bias the system towards either line/space or dot array patterns, depending on the pitch and linewidth of the prepattern. This contrasts with typical DSA, wherein assembly of a single-component block copolymer on chemical templates generates patterns of either lines/spaces (lamellar) or hexagonal dot arrays (cylinders). In our approach, the chemical template encodes desired local spatial arrangements of coexisting design motifs, self-assembled from a single, sophisticated resist.

Author : Joan K. Bosworth
Publisher :
Page : 0 pages
File Size : 29,55 MB
Release : 2009
Category :
ISBN :

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Block copolymer self assembly presents a method for patterning and templating applications on the 10-50 nm length scale, a smaller scale than can be easily achieved by photolithography. Here we investigate the use of functionalized polar-nonpolar block copolymers both as photopatternable self-assembling materials and for selective infiltration of one block for patterning. Block copolymer thin films with defect-free self-assembled morphology over large domains combined with careful control of the orientation of the morphology are critical for these patterning applications. Self assembly of block copolymers is facilitated by polymer chain mobility, commonly achieved by heating block copolymer films above the glass transition temperature of the blocks. However, many block copolymer systems, including those discussed here, are thermally incompatible. Swelling in a solvent vapor, called solvent annealing, provides sufficient mobility for self assembly. Solvent annealing proved critical to forming ordered structures of functional polar-nonpolar block copolymer thin films. Thermal instability initially led to limited self assembly of combined topdown/bottom-up block copolymer systems. In this case, photolithographic functionality has been designed into block copolymers, allowing the majority component of a block copolymer to behave as a negative-tone photoresist. Solvent vapor annealing has provided a simple and inexpensive method for allowing the bottom-up self assembly of these top-down photopatternable materials. An additional benefit of solvent annealing is the ability to reversibly tune the morphology formed using the selectivity of different swelling solvents to the two blocks: that is, the choice of solvent for annealing directs the formation of different morphologies in the dried film, here spherical and cylindrical. This behavior is reversible, alternating annealing sessions lead to switching of the morphology in the film. Secondary ordering techniques applied in tandem with solvent annealing can be used to further control the self assembly and give highly ordered block copolymer domains. Here we demonstrate the use of graphoepitaxy to align block copolymer self assembly to patterns in substrates. The combination of block copolymer self assembly with lithographic crosslinking in films was initially pursued to allow precise location of assembled patterns. Taking this behavior a step further, we combine solvent annealing, used to reversibly tune the self-assembled morphology, and lithographic patterning, used to prevent switching in exposed regions. This combined process has provided a method for selectively patterning 100 nm-wide domains of spherical morphology within regions of parallel-oriented cylindrical morphology. We also investigate solvent annealing of a block copolymer blended with a hydrogen bonding material that selectively segregates into the polar block. Blending provides a method of tuning the periodicity upon solvent annealing for self assembly, with morphology control again possible by solvent selectivity. Selective extraction of the blended material forms voids displaying the tunable periodicity, and the pattern is then transferred by templating to inorganic materials.

Author : Volker Abetz
Publisher : Springer Science & Business Media
Page : 264 pages
File Size : 41,87 MB
Release : 2005-12-02
Category : Technology & Engineering
ISBN : 9783540265801

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1 N. Hadjichristidis, M. Pitsikalis, H. Iatrou: Synthesis of Block Copolymers.- 2 V. Abetz: Phase Behaviour and Morphologies of Block Copolymers.-