[PDF] Molecular Resists For Advanced Lithography Design Synthesis Characterization And Simulation eBook

Author : Richard A. Lawson
Publisher :
Page : pages
File Size : 22,17 MB
Release : 2011
Category : Integrated circuits
ISBN :

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Many problems exist in current photoresist designs that will limit their ability to obtain the performance required for future generations of integrated circuit devices. In order to overcome these challenges, novel resist designs are required, along with advancement in the fundamental understanding of the source of these problems. A mesoscale kinetic Monte Carlo simulation of resists was developed to probe the effects of changes in resist formulation and processing. A detailed SEM simulator was developed in order to better understand the effect of metrology on the characterization of the final resist relief image. Several important structure-property relations were developed for the prediction of glass transition temperature in molecular resists and the prediction of the solubility of molecular resists in developer. Five new families of molecular resists were developed that provide solutions to some of the limitations in current resist designs. Single component molecular resists have all of the functional groups required to act as a chemically amplified resist contained in a single molecule. This eliminates inhomogeneities in the resist and provides improved line edge roughness. Non-chemically amplified molecular resists were developed that have very good sensitivity due to the unique dissolution properties of molecular resists. Negative tone molecular resists were developed that have an excellent combination of resolution, sensitivity, and line edge roughness with better resolution than has been previously seen in negative tone resists. Control methods were also developed to improve the resolution of these types of negative tone resists even further.

Author :
Publisher : Elsevier
Page : 636 pages
File Size : 24,66 MB
Release : 2016-11-08
Category : Science
ISBN : 0081003587

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As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place

Author : National Research Council
Publisher : National Academies Press
Page : 238 pages
File Size : 26,89 MB
Release : 2003-03-19
Category : Science
ISBN : 0309168392

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Chemistry and chemical engineering have changed significantly in the last decade. They have broadened their scopeâ€"into biology, nanotechnology, materials science, computation, and advanced methods of process systems engineering and controlâ€"so much that the programs in most chemistry and chemical engineering departments now barely resemble the classical notion of chemistry. Beyond the Molecular Frontier brings together research, discovery, and invention across the entire spectrum of the chemical sciencesâ€"from fundamental, molecular-level chemistry to large-scale chemical processing technology. This reflects the way the field has evolved, the synergy at universities between research and education in chemistry and chemical engineering, and the way chemists and chemical engineers work together in industry. The astonishing developments in science and engineering during the 20th century have made it possible to dream of new goals that might previously have been considered unthinkable. This book identifies the key opportunities and challenges for the chemical sciences, from basic research to societal needs and from terrorism defense to environmental protection, and it looks at the ways in which chemists and chemical engineers can work together to contribute to an improved future.

Author : William A. Goddard III
Publisher : CRC Press
Page : 1080 pages
File Size : 23,24 MB
Release : 2007-05-03
Category : Science
ISBN : 142000784X

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The ability to study and manipulate matter at the nanoscale is the defining feature of 21st-century science. The first edition of the standard-setting Handbook of Nanoscience, Engineering, and Technology saw the field through its infancy. Reassembling the preeminent team of leading scientists and researchers from all areas of nanoscience and nanote

Author :
Publisher :
Page : 456 pages
File Size : 46,52 MB
Release : 1995
Category : Aeronautics
ISBN :

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Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.

Author : American Chemical Society. Committee on Professional Training
Publisher :
Page : 1932 pages
File Size : 19,13 MB
Release : 2005
Category : Biochemistry
ISBN :

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Faculties, publications and doctoral theses in departments or divisions of chemistry, chemical engineering, biochemistry and pharmaceutical and/or medicinal chemistry at universities in the United States and Canada.

Author : M Feldman
Publisher : Woodhead Publishing
Page : 599 pages
File Size : 36,82 MB
Release : 2014-02-13
Category : Technology & Engineering
ISBN : 0857098756

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Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, “What comes next? and “How do we get there? Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics. This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics