[PDF] Materials Technology And Reliability For Advanced Interconnects 2005 Volume 863 eBook

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Handbook of Thin Film Deposition

Author : Krishna Seshan
Publisher : William Andrew
Page : 472 pages
File Size : 50,84 MB
Release : 2018-02-23
Category : Technology & Engineering
ISBN : 0128123125

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Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries Features a new chapter discussing Gates Dielectrics

Materials and Strength of Gas Turbine Parts

Author : Leonid Borisovich Getsov
Publisher : Springer Nature
Page : 469 pages
File Size : 35,93 MB
Release : 2021-04-17
Category : Science
ISBN : 9811605343

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This book discusses several mechanical and material problems that are typical for gas turbine components. It discusses accelerated tests and other methods for increasing the reliability of gas turbine engines. Special attention is given to non-traditional methods for calculating the strength characteristics and longevity of the main components. This first volume focuses on the selection of materials, deformation and destruction mechanisms in connection with stationary and non-stationary loading, and types of material damage such as the thermal fatigue. Particular attention is paid to the issues of the properties of single crystal alloys, the relationship between structure and properties, the influence of technological factors and long-term operation. The characteristics of creep resistance, crack resistance, and resistance to cyclic deformation of different alloys are given.

Handbook of Semiconductor Manufacturing Technology

Author : Yoshio Nishi
Publisher : CRC Press
Page : 1720 pages
File Size : 44,42 MB
Release : 2017-12-19
Category : Technology & Engineering
ISBN : 1420017667

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Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics:

Author : G. S. Oehrlein
Publisher : Cambridge University Press
Page : 614 pages
File Size : 43,43 MB
Release : 2014-06-05
Category : Technology & Engineering
ISBN : 9781107413153

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This book highlights important achievements and challenges in advanced interconnects and low-k dielectrics as employed in the microelectronics industry. The replacement of Al alloys with Cu along with the introduction of new barrier materials to protect Cu from chemical attack, and the utilization of new dielectric materials with a lower relative dielectric constant k than SiO2 in multilevel metallization structures of increasing complexity, are the major themes of evolution in this field. Invited reviews illustrate the significant progress that has been achieved as well as the challenges that remain. Contributed papers presented by researchers from different countries demonstrate progress on current topics using a truly multidisciplinary approach.

Interconnect Reliability in Advanced Memory Device Packaging

Author : Chong Leong, Gan
Publisher : Springer Nature
Page : 223 pages
File Size : 18,18 MB
Release : 2023-05-30
Category : Computers
ISBN : 3031267087

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This book explains mechanical and thermal reliability for modern memory packaging, considering materials, processes, and manufacturing. In the past 40 years, memory packaging processes have evolved enormously. This book discusses the reliability and technical challenges of first-level interconnect materials, packaging processes, advanced specialty reliability testing, and characterization of interconnects. It also examines the reliability of wire bonding, lead-free solder joints such as reliability testing and data analyses, design for reliability in hybrid packaging and HBM packaging, and failure analyses. The specialty of this book is that the materials covered are not only for second-level interconnects, but also for packaging assembly on first-level interconnects and for the semiconductor back-end on 2.5D and 3D memory interconnects. This book can be used as a text for college and graduate students who have the potential to become our future leaders, scientists, and engineers in the electronics and semiconductor industry.

Advanced Devices and Materials for Laser Remote Sensing: Volume 883

Author : Materials Research Society. Meeting
Publisher :
Page : 280 pages
File Size : 49,45 MB
Release : 2005-08-25
Category : Technology & Engineering
ISBN :

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Micro- and Nanosystems: Volume 872

Author : Materials Research Society. Meeting
Publisher :
Page : 552 pages
File Size : 15,25 MB
Release : 2005-11-08
Category : Technology & Engineering
ISBN :

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.