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It is increasingly apparent that ion-beam-based processing offers unique capabilities for fabrication and complex patterning of 3D, 2D or 1D structures at the few-nanometer scale (e.g., nanowires and quantum dots), and for custom tailoring of nanocomposites, nanoporous materials, catalyst surfaces, optical materials and nanoparticle assemblies. This book addresses achievements, applications and insights into such areas. It also seeks to identify potential dimensional limitations to the future practical implementation of this approach. Topics include: ion-beam nanofab - tools, techniques and applications; patterning, quantum dot synthesis and self assembly; and examples - applications and devices.
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
It is increasingly apparent that ion-beam-based processing offers unique capabilities for fabrication and complex patterning of 3D, 2D or 1D structures at the few-nanometer scale (e.g., nanowires and quantum dots), and for custom tailoring of nanocomposites, nanoporous materials, catalyst surfaces, optical materials and nanoparticle assemblies. This book addresses achievements, applications and insights into such areas. It also seeks to identify potential dimensional limitations to the future practical implementation of this approach. Topics include: ion-beam nanofab - tools, techniques and applications; patterning, quantum dot synthesis and self assembly; and examples - applications and devices.
Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attracti
This thesis constitutes a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques. The nanostructures were grown using different precursor materials such as Co2(CO)8, Fe2(CO)9, W(CO)6, (CH3)3Pt(CpCH3) and were characterized by a wide range of techniques. This work reports results obtained for the morphology, the microstructure, the composition, the electrical transport mechanism, magnetic and superconducting properties of nanostructures. The results offers exciting prospects in a wide range of applications in nanotechnology and condensed matter physics.
Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.
While many books are dedicated to individual aspects of nanofabrication, there is no single source that defines and explains the total vision of the field. Filling this gap, Nanofabrication Handbook presents a unique collection of new and the most important established approaches to nanofabrication. Contributors from leading research facilities and
This book provides the reader with the most up-to-date information and development in the Nanofabrication area. It presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The book serves as a practical guide and first hand reference for those working in nanostructure fabrication.