[PDF] Fundamental Electron Interactions With Plasma Processing Gases eBook

Author : Loucas G. Christophorou
Publisher : Springer Science & Business Media
Page : 791 pages
File Size : 12,40 MB
Release : 2012-12-06
Category : Science
ISBN : 1441989714

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This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

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Page : pages
File Size : 28,29 MB
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Presents electron-collision cross section data and transport coefficients for gases used in the manufacturing of semiconductor devices from the Electronics and Electrical Engineering Laboratory (EEEL) of the National Institute of Standards and Technology (NIST) in Gaithersburg, Maryland. Notes that the purpose of the information is to provide data for gases used in the plasma processing of semiconductor devices. Lists the gases that are being investigated.

Author : National Research Council
Publisher : National Academies Press
Page : 88 pages
File Size : 16,41 MB
Release : 1991-02-01
Category : Technology & Engineering
ISBN : 0309045975

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Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.

Author : R.J. Shul
Publisher : Springer Science & Business Media
Page : 664 pages
File Size : 43,65 MB
Release : 2011-06-28
Category : Technology & Engineering
ISBN : 3642569897

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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Author : Gorur Govinda Raju
Publisher : CRC Press
Page : 826 pages
File Size : 23,39 MB
Release : 2018-09-03
Category : Science
ISBN : 1351833324

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With the constant emergence of new research and application possibilities, gaseous electronics is more important than ever in disciplines including engineering (electrical, power, mechanical, electronics, and environmental), physics, and electronics. The first resource of its kind, Gaseous Electronics: Tables, Atoms, and Molecules fulfills the author’s vision of a stand-alone reference to condense 100 years of research on electron-neutral collision data into one easily searchable volume. It presents most—if not all—of the properly classified experimental results that scientists, researchers, and students require for a theoretical and practical understanding of collision properties and their impact. An unprecedented collection and analysis of electron neutral collision properties This book follows a new user-friendly format that enables readers to easily retrieve, analyze, and apply specific atomic/molecular information as needed. In his previous work, Gaseous Electronics: Theory and Practice, the author first explored electron–neutron interactions. To clarify the complex fundamental processes involved, he cited as much experimental data on atoms and molecules as limited space would allow. Completing that task, this handy reference more fully compiles essential revised data on more than 420 atoms and molecules, arranging it into easily digestible chapters, sections, and appendices. Analysis parameters include total scattering, ionization, excitation, attachment cross sections, ionization and attachment coefficients, attachment rates, and ion drift velocity. Some recent research areas in gaseous electronics include: Environmentally efficient and protective lighting devices Plasma research for power generation and space applications Medical applications (some involving skin treatment and healing) Written entirely in SI units, the book includes hundreds of tables, figures, and specially drawn charts, with data expressed in both tabular and graphical form. Each chapter stands independently and contains references for further research.

Author : K. N. Joshipura
Publisher : Cambridge University Press
Page : 286 pages
File Size : 32,36 MB
Release : 2019-01-24
Category : Science
ISBN : 1108498906

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Covers quantum scattering theories, experimental and theoretical calculations and applications in a comprehensive manner.

Author : Jörg Florian Friedrich
Publisher : John Wiley & Sons
Page : 805 pages
File Size : 38,71 MB
Release : 2022-07-15
Category : Science
ISBN : 1119364760

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NONTHERMAL PLASMAS FOR MATERIALS PROCESSING This unique book covers the physical and chemical aspects of plasma chemistry with polymers and gives new insights into the interaction of physics and chemistry of nonthermal plasmas and their applications in materials science for physicists and chemists. The properties and characteristics of plasmas, elementary (collision) processes in the gas phase, plasma surface interactions, gas discharge plasmas and technical plasma sources, atmospheric plasmas, plasma diagnostics, polymers and plasmas, plasma polymerization, post-plasma processes, plasma, and wet-chemical processing, plasma-induced generation of functional groups, and the chemical reactions on these groups along with a few exemplary applications are discussed in this comprehensive but condensed state-of-the-art book on plasma chemistry and its dependence on plasma physics. While plasma physics, plasma chemistry, and polymer science are often handled separately, the aim of the authors is to harmoniously join the physics and chemistry of low-pressure and atmospheric-pressure plasmas with polymer surface chemistry and polymerization and to compare such chemistry with classic chemistry. Readers will find in these chapters Interaction of plasma physics and chemistry in plasmas and at the surface of polymers; Explanation and interpretation of physical and chemical mechanisms on plasma polymerization and polymer surface modification; Introduction of modern techniques in plasma diagnostics, surface analysis of solids, and special behavior of polymers on exposure to plasmas; Discussion of the conflict of energy-rich plasma species with permanent energy supply and the much lower binding energies in polymers and alternatives to avoid random polymer decomposition Technical applications such as adhesion, cleaning, wettability, textile modification, coatings, films, etc. New perspectives are explained about how to use selective and mild processes to allow post-plasma chemistry on non-degraded polymer surfaces. Audience Physicists, polymer chemists, materials scientists, industrial engineers in biomedicine, coatings, printing, etc.

Author :
Publisher : Academic Press
Page : 642 pages
File Size : 25,96 MB
Release : 2017-06-07
Category : Science
ISBN : 012812184X

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Advances in Atomic, Molecular, and Optical Physics, Volume 66 provides a comprehensive compilation of recent developments in a field that is in a state of rapid growth. New to this volume are chapters devoted to 2D Coherent Spectroscopy of Electronic Transitions, Nonlinear and Quantum Optical Properties and Applications of Intense Twin-Beams, Non-classical Light Generation from III-V and Group-IV Solid-State Cavity Quantum Systems, Trapping Atoms with Radio Frequency Adiabatic Potentials, Quantum Control of Optomechanical Systems, and Efficient Description of Bose–Einstein Condensates in Time-Dependent Rotating Traps. With timely articles written by distinguished experts that contain relevant review materials and detailed descriptions of important developments in the field, this series is a must have for those interested in the variety of topics covered. Presents the work of international experts in the field Contains comprehensive articles that compile recent developments in a field that is experiencing rapid growth, with new experimental and theoretical techniques emerging Ideal for users interested in optics, excitons, plasmas, and thermodynamics Topics covered include atmospheric science, astrophysics, surface physics, and laser physics, amongst others

Author : Yoshihiko Hatano
Publisher : CRC Press
Page : 1068 pages
File Size : 45,96 MB
Release : 2010-12-13
Category : Science
ISBN : 1439811806

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Building on Mozumder's and Hatano's Charged Particle and Photon Interactions with Matter: Chemical, Physicochemical, and Biological Consequences with Applications (CRC Press, 2004), Charged Particle and Photon Interactions with Matter: Recent Advances, Applications, and Interfaces expands upon the scientific contents of the previous volume by cover

Author : Loucas G. Christophorou
Publisher :
Page : 8 pages
File Size : 19,11 MB
Release : 2004
Category :
ISBN :

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The authors recently completed an updated review, synthesis, assessment, and discussion of low-energy electron interactions with the plasma processing gases CF4, C2F6, C3F8, CHF3, CF3I, c-C4F8, Cl2, CCl2F2, BCl3, and SF6. This work, along with fundamental knowledge on electron-molecule collision processes, the definition of the various electron collision cross-sections and rate coefficients, and the experimental and theoretical methods used for their determination have been described in Christophorou and Olthoff. It has been shown in this reference, that reliable data on the electron transport, electron attachment, and electron-impact ionization coefficients generally exist for most of these molecules, except for electron transport in strongly electronegative gases. Also, reliable data exist on the collision cross-sections for most of these molecules, but this knowledge depends on the collision process and the molecule under consideration. The cross-sections and coefficients that have been recommended or suggested were based on experimental measurements. This work has shown that while a great deal of quantitative data have become available, especially recently, for the molecules under consideration, there is still a pressing need for quantitative measurements of the cross sections for electron-impact dissociation into neutral fragments, direct and indirect vibrational (and electronic) excitation, and electron interaction processes involving excited and transient (radical) species.