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Advanced Purification and Direct-write 3D Nanoprinting Via Focused Electron Beam Induced Deposition

Author : Brett Bloxton Lewis
Publisher :
Page : 141 pages
File Size : 23,72 MB
Release : 2017
Category : Electron beams
ISBN :

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This dissertation addresses three difficulties with focused electron beam induced deposition preventing broader application; purity, spatial control, and mechanical characterization. Focused electron beam induced deposition (FEBID) has many advantages as a nanoscale fabrication tool. It is compatible for implementation into current lithographic techniques and has the potential to direct-write in a single step nanostructures of a high degree of complexity. FEBID is a very versatile tool capable of fabricating structures of many different compositions ranging from insulating oxides to conducting metals. Due to the complexity of the technique and the difficulty in directly measuring many important variables, FEBID has remained a niche technique for nanoscale fabrication and prototyping. The Achilles heel of FEBID is that, with few exceptions, the resultant structures are riddled with impurities. Also, the use of FEBID as a nanoscale 3D printing tool is limited and has historically been approached from a trial and error point of view To address these issues, we have developed an advanced low-temperature purification method through a post process involving the electron stimulated reaction of O2 and carbon contaminates. This method is discussed in Chapter 1. We have investigated parameters involved in three dimensional FEBID, demonstrating control over those parameters to produce predicable shapes with high precision and complexity as described in Chapter 2. It is non-trivial to purify simultaneous during 3D printing, and so we have studied and developed a method to accomplish that using an in situ pulsed laser thermal anneal. Chapter 3 demonstrates this fully in situ 3D purification process. Finally, for emerging applications it will be important to know the mechanical properties of intricate structures created through FEBID. To this end, we have developed a method for the mechanical characterization of 3D nanostructures fabricated using FEBID. The mechanical characterization process, tools, and results are detailed in Chapter 4.

Nanofabrication Using Focused Ion and Electron Beams

Author : Ivo Utke
Publisher : Oxford University Press
Page : 830 pages
File Size : 23,96 MB
Release : 2012-03-05
Category : Technology & Engineering
ISBN : 0199920990

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Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.

Advanced Nano Deposition Methods

Author : Yuan Lin
Publisher : John Wiley & Sons
Page : 328 pages
File Size : 33,61 MB
Release : 2016-12-12
Category : Technology & Engineering
ISBN : 3527340254

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This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.

Development of Advanced Methodologies for Three-dimensional Nanoprinting

Author : Joao Francisco Ventrici de Souza
Publisher :
Page : pages
File Size : 20,69 MB
Release : 2017
Category :
ISBN : 9780355461411

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Three-dimension (3D) printers are commercially available with resolution as high as micrometers. Further miniaturization would require development of both materials, instruments, as well as methodology in order to attain required spatial precision to reach nanometer scale. This dissertation reports our recent progress in producing 3D nanostructures using an atomic force microscopy (AFM) based methods. First, we use AFM to investigate and to better understanding the tip-molecular and molecule-molecules interactions using bilayer systems to begin the studies. The structure, phase behavior and properties of cellular membranes are determined by their composition which includes phospholipids, sphingolipids, sterols, and proteins with various level of glycosylation. Due to the intricate nature of cellular membranes, a plethora of in vitro studies have been carried out with model membrane platforms that capture specific properties such as fluidity and permeability, but vastly simplify the membrane composition in order to focus in detail on a single property or function. Supported lipid bilayer (SLB) systems are one such platform and this work focuses specifically on the characterization and engineering of SLB systems. A number of characterization methods which take advantage of the flat orientation of SLBs are described and references which go into more depth are included. This dissertation reports quantity and compares the quality of the resulting SLBs in correlation with a variety of gel and fluid compositions, preparation techniques and parameters, to generate general rules of thumb to guide preparation of designed SLB systems. Finally, our approaches to reduce morphologic defects are delineated. Secondly, we use modified AFM technology for both printing and characterization. By putting molecules to the AFM tips, then transfer them to surfaces via scanning, nanometer scale lines, cross-grids, and pyramids were constructed following designed geometry and size. The products were also characterized in situ using AFM to demonstrate the fidelity and spatial precision. Another approach taken in this dissertation towards the 3D nanoprinting goal is the direct delivery via combining AFM with microfluidic probes. Direct writing methods are a convenient way to produce 3D structures. The capability to extrude materials through a nozzle makes this method compatible with a wide range of inks. Although this method has been routinely used in the fabrication of structures on the microscale, the new challenge is to achieve 3D printing on the nanoscale. This dissertation reports the miniaturization of 3D structure production to line widths of 130 nm and heights of 3.1 nm. Three layered grids and custom designed objects were printed with the direct delivery of ultraviolet curable polymer. using a modified atomic force microscope (AFM). The enabling aspects of 3D nanoprinting should have significant impact on a broad range of applications including tissue engineering, biomaterials, biomimetics, nanophotonics materials, and nanodevices.

Electron Nanoprobe Induced Oxidation

Author :
Publisher :
Page : 11 pages
File Size : 49,40 MB
Release : 2015
Category :
ISBN :

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Electron beam direct-write has recently taken a large step forward with the advent of methods to purify deposits. This development has opened the door for future direct-write device prototyping and editing. In one such approach, an additional beam scanning procedure removes carbonaceous impurities via oxidation from metal-carbon deposits (e.g., PtC5) in the presence of H2O or O2 after deposition. So far, critical aspects of the oxidation reaction remain unclear; experiments reveal clearly that electron stimulated oxidation drives the process yet it is not understood why H2O purifies by a bottom-up mechanism while O2 purifies from the top-down. The simulation results presented here suggest that the chemisorption of dissolved O2 at buried Pt nanoparticle surfaces controls purification in the top-down case while both the high relative solubility coupled with weak physisorption of H2O explains the bottom-up process. Crucial too is the role that the carbonaceous contaminant itself has on the dissolution and diffusion of O2 and H2O. The results pave the way for simulation driven experiments where (1) the transient densification of the deposit can be accounted for in the initial deposit design stage and (2) the deposition and purification steps can be combined.

Nanofabrication

Author : José María de Teresa
Publisher :
Page : 0 pages
File Size : 41,95 MB
Release : 2020
Category : Nanolithography
ISBN : 9780750326087

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A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.

The Chemistry of Metal CVD

Author : Toivo T. Kodas
Publisher : John Wiley & Sons
Page : 562 pages
File Size : 47,8 MB
Release : 2008-09-26
Category : Technology & Engineering
ISBN : 3527615849

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High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.

Nanofabrication

Author : Maria Stepanova
Publisher : Springer Science & Business Media
Page : 344 pages
File Size : 32,81 MB
Release : 2011-11-08
Category : Technology & Engineering
ISBN : 3709104246

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Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.