[PDF] Non Classical Crystallization Of Thin Films And Nanostructures In Cvd And Pvd Processes eBook

Author : Nong Moon Hwang
Publisher : Springer
Page : 338 pages
File Size : 37,6 MB
Release : 2016-06-14
Category : Science
ISBN : 9401776164

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This book provides a comprehensive introduction to a recently-developed approach to the growth mechanism of thin films and nanostructures via chemical vapour deposition (CVD). Starting from the underlying principles of the low pressure synthesis of diamond films, it is shown that diamond growth occurs not by individual atoms but by charged nanoparticles. This newly-discovered growth mechanism turns out to be general to many CVD and some physical vapor deposition (PVD) processes. This non-classical crystallization is a new paradigm of crystal growth, with active research taking place on growth in solution, especially in biomineralization processes. Established understanding of the growth of thin films and nanostructures is based around processes involving individual atoms or molecules. According to the author’s research over the last two decades, however, the generation of charged gas phase nuclei is shown to be the rule rather than the exception in the CVD process, and charged gas phase nuclei are actively involved in the growth of films or nanostructures. This new understanding is called the theory of charged nanoparticles (TCN). This book describes how the non-classical crystallization mechanism can be applied to the growth of thin films and nanostructures in gas phase synthesis. Based on the author’s graduate lecture course, the book is aimed at senior undergraduate and graduate students and researchers in the field of thin film and nanostructure growth or crystal growth. It is hoped that a new understanding of the growth processes of thin films and nanostructures will reduce trial-and-error in research and in industrial fabrication processes.

Author : Jae-soo Jung
Publisher :
Page : pages
File Size : 35,81 MB
Release : 2016
Category : Science
ISBN :

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Non-classical crystallization, where crystals grow by the building blocks of nanoparticles, has become a significant issue not only in solution but also in the gas phase synthesis such as chemical vapor deposition (CVD). Recently, non-classical crystallization was observed in solution in-situ by transmission electron microscope (TEM) using a liquid cell technique. In various CVD processes, the generation of charged nanoparticles (CNPs) in the gas phase has been persistently reported. Many evidences supporting these CNPs to be the building blocks of thin films and nanostructures were reported. According to non-classical crystallization, many thin films and nanostructures which had been believed to grow by individual atoms or molecules turned out to grow by the building blocks of CNPs. The purpose of this paper is to review the development and the main results of non-classical crystallization in the CVD process. The concept of non-classical crystallization is briefly described. Further, it will be shown that the puzzling phenomenon of simultaneous diamond deposition and graphite etching, which violates the second law of thermodynamics when approached by classical crystallization, can be approached successfully by non-classical crystallization. Then, various aspects of non-classical crystallization in the growth of thin films and nanostructures by CVD will be described.

Author : S Neralla
Publisher : BoD – Books on Demand
Page : 292 pages
File Size : 17,74 MB
Release : 2016-08-31
Category : Science
ISBN : 9535125729

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This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.

Author :
Publisher : Elsevier
Page : 292 pages
File Size : 24,89 MB
Release : 2018-11-20
Category : Science
ISBN : 0128139358

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Nano-sized Multifunctional Materials: Synthesis, Properties and Applications explores how materials can be down-scaled to nanometer-size in order to tailor and control properties. These advanced, low-dimensional materials, ranging from quantum dots and nanoparticles, to ultra-thin films develop multifunctional properties. As well as demonstrating how down-scaling to nano-size can make materials multifunctional, chapters also show how this technology can be applied in electronics, medicine, energy and in the environment. This fresh approach in materials research will provide a valuable resource for materials scientists, materials engineers, chemists, physicists and bioengineers who want to learn more on the special properties of nano-sized materials. Outlines the major synthesis chemical process and problems of advanced nanomaterials Shows how multifunctional nanomaterials can be practically used in biomedical area, nanomedicine, and in the treatment of pollutants Demonstrates how the properties of a variety of materials can be engineered by downscaling them to nano size

Author : C.E. Morosanu
Publisher : Elsevier
Page : 720 pages
File Size : 45,38 MB
Release : 2016-06-22
Category : Technology & Engineering
ISBN : 1483291731

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The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.

Author : William S. Rees, Jr.
Publisher : John Wiley & Sons
Page : 441 pages
File Size : 36,78 MB
Release : 2008-09-26
Category : Technology & Engineering
ISBN : 352761480X

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Written by leading experts in the field, this practical reference handbook offers an up-to-date, critical survey of the chemical vapor deposition (CVD) of nonmetals, a key technology in semiconductor electronics, finishing, and corrosion protection. The basics necessary for any CVD process are discussed in the introduction. In the following chapters, precursor requirements, with an emphasis on materials chemistry, common structures of reactants and substrates, as well as reaction control are discussed for a broad range of compositions including superconducting, conducting, semiconducting, insulating and structural materials. Technological issues, such as reactor geometries and operation parameters, are assessed and the viability of the method, both technically and economically, is compared with other techniques for the preparation of thin films. Relevant materials and technical data are collected in tables throughout. An extensive glossary, list of abbreviations and acronyms, and over 1400 references round off this impressive work. The 'CVD of Nonmetals' offers a stimulating combination of basic concepts and practical applications. Materials scientists, solid-state and organometallic chemists, physicists, engineer, as well as graduate students will find this book of enomous value.

Author : Kwang-Leong Choy
Publisher : CRC Press
Page : 492 pages
File Size : 31,72 MB
Release : 2019-06-07
Category : Science
ISBN : 1000691071

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This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properties to practical use, cost considerations, versatility, and sustainability. The author presents a comprehensive overview of CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films. Features Provides an up-to-date introduction to CVD technology for the fabrication of nanomaterials, nanostructured films, and composite coatings Discusses processing, structure, functionalization, properties, and use in clean energy, engineering, and biomedical grand challenges Covers thin and thick films and composites Compares CVD with other processing techniques in terms of structure/properties, cost, versatility, and sustainability Kwang-Leong Choy is the Director of the UCL Centre for Materials Discovery and Professor of Materials Discovery in the Institute for Materials Discovery at the University College London. She earned her D.Phil. from the University of Oxford, and is the recipient of numerous honors including the Hetherington Prize, Oxford Metallurgical Society Award, and Grunfeld Medal and Prize from the Institute of Materials (UK). She is an elected fellow of the Institute of Materials, Minerals and Mining, and the Royal Society of Chemistry.

Author : D. Misra
Publisher : The Electrochemical Society
Page : 67 pages
File Size : 35,88 MB
Release : 2010-10
Category : Science
ISBN : 1566778417

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The papers included in this issue of ECS Transactions were originally presented in the symposium ¿Thermal and Plasma CVD of Nanostructures and their Applications¿, held during the 217th meeting of The Electrochemical Society, in Vancouver, Canada, from April 25 to 30, 2010.

Author : Vladislav Yu Vasilyev
Publisher :
Page : 320 pages
File Size : 11,36 MB
Release : 2014-01-01
Category : Chemical vapor deposition
ISBN : 9781633211865

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This monograph is a summary of equipment, methodology and thin film growth experience obtained by the author during his 30 years of research work in the field of Integrated Circuit (IC) device technology. The monograph is concerned with the analysis of different aspects of different types of inorganic thin films grown by Chemical Vapor Deposition (CVD) methods and dedicated to the use in IC technology and production. The author discusses the methodology issues of thin film CVD and the fundamentals of the chemical kinetics of thin film growth. The main core of this monograph is the analysis of thin film CVD kinetics features obtained using different types of reactors, chemical compounds, process conditions. The monograph covers a wide variety of CVD-related aspects: equipment analysis, chemical compound features, CVD process methodology analysis, CVD kinetic features and their quantitative characterization, implementation of obtained numerical equations for thin film step coverage and gap-fill issues, interrelation of the film properties and CVD process features, and CVD process classification. The author would like to highlight that all the data presented in this book has been experimentally obtained by a number of research groups. Most of the data has been double-checked and confirmed. Surely, some data could not be repeated because it was obtained a long time ago using some specific deposition tools and processes. Nevertheless, the author would like to stress that he considers this book as an attempt to create a whole view on the thin film CVD for IC device technology applications. In this regard, the author has tried to generalize a large amount of experimental data, selecting the most common features of the film growth, composition, structure, and properties.