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The combination of lithography and self-assembly provides apowerful means of organizing solution-synthesized nanostructures for awide variety of applications. We have developed a fluidic assembly methodthat relies on the local pinning of a moving liquid contact line bylithographically produced topographic features to concentratenanoparticles at those features. The final stages of the assembly processare controlled first by long-range immersion capillary forces and then bythe short-range electrostatic and Van der Waal's interactions. We havesuccessfully assembled nanoparticles from 50 nm to 2 nm in size usingthis technique and have also demonstrated the controlled positioning ofmore complex nanotetrapod structures. We have used this process toassemble Au nanoparticles into pre-patterned electrode structures andhave performed preliminary electrical characterization of the devices soformed. The fluidic assembly method is capable of very high yield, interms of positioning nanostructures at each lithographically-definedlocation, and of excellent specificity, with essentially no particledeposition between features.
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
For more than 50 years, the size of the semiconductor devices has been scaling by approximately a factor of two every 1.5-2 years. This has brought tremendous benefits for the industry including lower cost per transistor, more computing power and higher speed. However, it has been recently observed that the scaling of devices is approaching fundamental (i.e. atomic scale) and economic (i.e. cost per fabrication facility) limits, in large part because traditional lithography is facing substantial challenges for printing the shrinking features while maintaining a reasonable cost. In response to this urgent need, researchers are actively searching for alternative patterning approaches as the next generation lithography. Potential solutions such as extreme ultraviolet lithography, electron beam lithography, and multiple patterning lithography have attracted much attention from the lithography community. However, each one of these solutions has its own drawbacks, such as extremely high cost or low throughput. Among these solutions, block copolymer directed self-assembly (DSA) stands out due to its low cost, high throughput, well-controlled sub-20 nm features, and experimentally demonstrated potential to scale below 14 nm. Block copolymers are unique soft materials that can self-assemble through microphase separation into various periodic nanostructures such as cylinders, spheres and lamellas, driven by the incompatibility between the different blocks. The feature size of these nanostructures is dependent on the molecular weight of the block copolymers and therefore not limited by the same factors that limit optical lithography such as ultraviolet light wavelength. In addition, the self-assembly could be controlled by a simple thermal annealing process, which significantly reduces the cost and improves the throughput. Among all the varieties of nanostructures, the cylindrical self-assembled patterns are especially suitable for patterning contacts and vias in integrated circuits (ICs). This dissertation focuses on the application of block copolymer DSA for contact hole patterning in ICs. This work first demonstrates the flexible control of aperiodic DSA patterns using small physical guiding templates, using both experiments and computational simulations. This is followed by the first patterning example of memory and random logic circuit contacts using DSA. To enable practical technology adoption, I introduce an alphabet approach that uses a minimal set of small physical templates to pattern all contact configurations on integrated circuits. This work also illustrates, through experiments, a general and scalable template design strategy that links the DSA material properties to the technology node requirements. Last but not least, the dissertation introduces a method to reduce DSA defectivity by using sub-DSA-resolution Assist Features (SDRAFs).
In this thesis, we investigated three-dimensional (3D) nanofabrication using electron-beam lithography (EBL), block copolymer (BCP) self-assembly, and capillary force-induced self-assembly. We first developed new processes for fabricating 3D nanostructures using a hydrogen silsesquioxane (HSQ) and poly(methylmeth-acrylate) (PMMA) bilayer resist stack. We demonstrated self-aligned mushroom-shaped posts and freestanding supported structures. Next, we used the 3D nanostructures as topographical templates guiding the self-assembly of polystyrene-b-polydimethylsiloxane (PS-b-PDMS) block copolymer thin films. We observed parallel cylinders, mesh-shaped structures, and bar-shaped structures in PDMS. Finally, we studied capillary force-induced self-assembly of linear nanostructures using a spin drying process. We developed a computation schema based on the pairwise collapse of nanostructures. We achieved propagation of information and built a proof of concept logic gate.
Nanostructures refer to materials that have relevant dimensions on the nanometer length scales and reside in the mesoscopic regime between isolated atoms and molecules in bulk matter. These materials have unique physical properties that are distinctly different from bulk materials. Self-Assembled Nanostructures provides systematic coverage of basic nanomaterials science including materials assembly and synthesis, characterization, and application. Suitable for both beginners and experts, it balances the chemistry aspects of nanomaterials with physical principles. It also highlights nanomaterial-based architectures including assembled or self-assembled systems. Filled with in-depth discussion of important applications of nano-architectures as well as potential applications ranging from physical to chemical and biological systems, Self-Assembled Nanostructures is the essential reference or text for scientists involved with nanostructures.
Block copolymers (BCPs) are a group of fascinating materials that self-assemble into highly uniform nanoscale structures. With precise control of interfacial properties on both interfaces, these nanostructures can be directed to form user-defined periodic patterns. The directed self-assembly (DSA) of BCPs offers a cost-effective solution to complement the conventional lithography with the capability of density multiplication and pattern rectification. This dissertation mainly focuses on the chemoepitaxial DSA of symmetric BCP into line patterns.
Directed self-assembly (DSA) of block copolymers (BCPs) has been shown as a viable method to achieve bulk fabrication of surface patterns with feature sizes smaller than those available through traditional photolithography. Under appropriate thermodynamic conditions, BCPs will self-assemble into ordered micro-domain morphologies, a desirable feature for many applications. One of the primary interests in this field of research is the application of thin-film BCPs to existing photolithography techniques. This "bottom-up" approach utilizes the self-assembled BCP nanostructures as a sacrificial templating layer in the lithographic process. While self-assembly occurs spontaneously, extending orientational uniformity over centimeter-length scales remains a critical challenge. A number of DSA techniques have been developed to enhance the long range order in an evolving BCP system during micro-phase separation. Of primary interest to this dissertation is the synergistic behavior between chemoepitaxial templating and cold-zone annealing. The first method involves pre-treating a substrate with chemical boundaries that will attract or repel one of the monomer blocks before application of the thin-film via spin-coating. The second method applies a mobile, thermal gradient to induce micro-phase separation in a narrow region within the homogeneous thin-film . Parametric studies have been performed to characterize the extent of long range order and defect densities obtained by applying various thermal zone velocities and template patterns. These simulations are performed by utilizing a Time-Dependent Ginzburg-Landau (TDGL) model and an optimized phase field (OPF) model. Parallel processing is implemented to allow large-scale simulations to be performed within a reasonable time period.
Materials Nanoarchitectonics: From Integrated Molecular Systems to Advanced Devices provides the latest information on the design and molecular manipulation of self-organized hierarchically structured systems using tailor-made nanoscale materials as structural and functional units. The book is organized into three main sections that focus on molecular design of building blocks and hybrid materials, formation of nanostructures, and applications and devices. Bringing together emerging materials, synthetic aspects, nanostructure strategies, and applications, the book aims to support further progress, by offering different perspectives and a strong interdisciplinary approach to this rapidly growing area of innovation. This is an extremely valuable resource for researchers, advanced students, and scientists in industry, with an interest in nanoarchitectonics, nanostructures, and nanomaterials, or across the areas of nanotechnology, chemistry, surface science, polymer science, electrical engineering, physics, chemical engineering, and materials science. Offers a nanoarchitectonic perspective on emerging fields, such as metal-organic frameworks, porous polymer materials, or biomimetic nanostructures Discusses different approaches to utilizing "soft chemistry" as a source for hierarchically organized materials Offers an interdisciplinary approach to the design and construction of integrated chemical nano systems Discusses novel approaches towards the creation of complex multiscale architectures