[PDF] Directed Self Assembly Of Diblock Copolymer Thin Films On Chemically Nanopatterned Substrates eBook

Author : Roel Gronheid
Publisher : Woodhead Publishing
Page : 328 pages
File Size : 24,56 MB
Release : 2015-07-17
Category : Technology & Engineering
ISBN : 0081002610

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The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

Author : Ophelia Kwan Chui Tsui
Publisher : World Scientific
Page : 312 pages
File Size : 36,95 MB
Release : 2008
Category : Science
ISBN : 9812818820

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Ch. 1. Block copolymer thin films / J.-Y. Wang, S. Park and T. P. Russell -- ch. 2. Equilibration of block copolymer films on chemically patterned surfaces / G. S. W. Craig, H. Kang and P. F. Nealey -- ch. 3. Structure formation and evolution in confined cylinder-forming block copolymers / G. J. A. Sevink and J. G. E. M. Fraaije -- ch. 4. Block copolymer lithography for magnetic device fabrication / J. Y. Cheng and C. A. Ross -- ch. 5. Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura ... [et al.] -- ch. 6. Wrinkling polymers for surface structure control and functionality / E. P. Chan and A. J. Crosby -- ch. 7. Crystallization in polymer thin films: morphology and growth / R. M. Van Horn and S. Z. D. Cheng -- ch. 8. Friction at soft polymer surface / M. K. Chaudhury, K. Vorvolakos and D. Malotky -- ch. 9. Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K. R. Shull -- ch. 10. Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- ch. 11. Anomalous dynamics of polymer Films / O. K. C. Tsui.

Author : Arzu Hayirlioglu
Publisher :
Page : 138 pages
File Size : 19,69 MB
Release : 2014
Category : Block copolymers
ISBN :

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Ordering of block copolymer (BCP) thin films has been great interest for potential applications due to nanometer scale size self-assembly pattern formation. Numerous methods (chemical, physical, etc.) have been developed to create desired alignment and ordering properties in such block copolymer systems. However, the drawback of most current technologies such as brittleness and lack conformability to different surfaces makes them difficult to implement new emerging high-tech flexible technologies. On the other hand, there is a lack of knowledge in block copolymer wettability characteristics and morphological behavior on soft substrates which makes them attractive to explore for further investigations. A notable challenge in this regard is that successful deployment of BCPs for applications requires an understanding of BCP ordering properties on flexible substrate as a function of their surface chemistry, topography including patterning, roughness, stiffness, modulus and thermal conductivity, etc. Therefore, the general purpose of this research is to investigate the thermodynamics and kinetics of directed assembly of cylinder and lamellar forming polystyrene-block-polymethlymethacrylate (PS-b-PMMA) diblock copolymer films on elastomeric polydimethylsiloxane (PDMS) substrates with controlled surface energy and substrate topography. In first part, wettability characteristics of cylinder and lamellae forming PS-b-PMMA thin films versus surface energy of elastomeric PDMS substrates were increasing surface energy of PDMS by tuning with Ultraviolet Ozone (UVO) exposure and elasticity by varying the crosslinking concentration. In this extended wetting regime gradual perpendicular to parallel orientation change was shown for lamellar BCP films unlike cylindrical films where the transition was very sharp, reflecting lamellar BCP intrinsic stability over a wider range of substrate surface energy, consistent with theoretical estimates. In second part of the study, we extended the part on wettability characteristics of polystyrene (PS) homopolymer and PS-b-PMMA block copolymer thin films on flat, periodic and non-periodic nanopatterned elastomeric PDMS substrates. We discovered creating non-periodically nanopatterned surface properties induced retardation of BCP dewetting and mostly eliminate on periodically nanopatterned surface properties without any surface chemistry modification. Time kinetic study results also showed the patterning has a slowing down effect on dewetting mechanism for both homopolymer and block copolymer systems and dewetted droplet shape. In final part of this study, we focused on block copolymer morphology on periodically and non-periodically (rough) patterned elastomeric PDMS substrates with and without tuning the substrate surface energy via UVO exposure. The regular uniform film properties were achieved with parallel or perpendicular microdomain orientation to the substrate at even imcommensurate thicknesses which normally shows island and holes on flat surfaces. In addition to the bottom pattern confinement effect on BCP ordering, uniform size patterned elastomeric top capping layer was also used. Mixed or long range ordered structures were obtained with different annealing conditions.

Author : Nathanael Lap-Yan Wu
Publisher :
Page : 185 pages
File Size : 33,72 MB
Release : 2014
Category : Block copolymers
ISBN :

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The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the dimensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new fabrication strategies must be introduced for these remarkable advances to continue. One technology listed by the International Technology Roadmap for Semiconductors as a candidate for next-generation nanostructure fabrication is the directed self-assembly of block copolymers. Block copolymers have received significant attention of late for their ability to template large regular arrays of nanostructures with dimensions ranging from 10 to 50 nm. The production of denser sub-10 nm nanostructures is also possible by reducing the size of these polymers, but a reduction of the polymer size also compromises the quality of nanostructures, making small polymers extremely difficult to use. In this thesis, two different patterning approaches are introduced to push the nanostructure density limits possible for a given polymer. In the first, a novel patterning approach involving thin films of bilayer block copolymer domains is used to effectively double the nanostructure density patterned by a given polymer. The technique is successfully applied to different types and sizes of polymer, and can also form highly controlled arrays of patterns with the help of surface topography. By varying different process parameters during the self-assembly or subsequent plasma steps, the dimensions of these density-doubled patterns may be finely-tuned to the desired width and pitch. The surface coverage of these density-doubled nanostructures is also maximized through adjusting the film thickness and parameters in the self-assembly process. Besides using bilayer films, dense arrays of nanostructures may also be patterned using a multi-step patterning approach. In this approach, multiple layers of block copolymer films are subsequently deposited onto the substrate to template nanostructures. Because nanostructures from previous layers contribute to the surface topography, they influence the self-assembly of successive layers and more dense and complex patterns may be produced as a result.

Author : Ren Zhang (Chemical engineer)
Publisher :
Page : 57 pages
File Size : 34,40 MB
Release : 2013
Category : Block copolymers
ISBN :

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Block copolymers (BCPs) have received considerable attention as a promising platform for synthesis of heterogeneous nanomaterials and fabrication of nanostructures with improved electrical, optical, or mechanical properties. Here we demonstrate a facile fabrication strategy towards long-range ordered block copolymer/nanoparticle (BCP/NP) hybrid structures utilizing a novel dynamic thermal field-induced gradient soft-shear process (CZA-SS). Structural uniformity of nanocomposite films is quantified in terms of the orientation order parameter (S) and it is demonstrated that CZA-SS can facilitate unidirectional alignment with low loading fraction of AuNP additives. The application of sharp dynamic thermal gradient process (CZA-S) is shown to result in the morphological transition from out-of plane to in-plane cylinder orientation that is rationalized as a consequence of suppressed normal expansion of AuNP filled BCP films. Our current work may open new avenues for fabrication of unidirectional oriented hybrid materials,